We report on a study of the Co intercalation process underneath the ##IMG## [http://ej.iop.org/images/0957-4484/30/2/025702/nanoaae8c9ieqn1.gif] {$(6sqrt{3}times 6sqrt{3})$} R30° reconstructed 6H-SiC(0001) surface for Co film-thicknesses in a range of 0.4–12 nm using a combination of surface sensitive imaging, diffractive, and spectroscopic methods. In situ photoemission electron microscopy reveals a dependence of the intercalation temperature on the Co film-thickness. Using low energy electron diffraction and photoemission spectroscopy (XPS), we find that the SiC surface reconstruction is partially lifted and transformed. We show that the ##IMG## [http://ej.iop.org/images/0957-4484/30/2/025702/nanoaae8c9ieqn2.gif] {$(6sqrt{3}times 6sqrt{3})$} R30° reconstruction does not prevent silicide formation for Cofilm-thicknesses ≥0.4 nm according to XPS and x-ray absorption spectra. Our results indicate that the silicide formati…
Published in: "Nanotechnology".