A photoresist‐free p–n junction and inverter in the MoTe2 homostructure are achieved by spatially controlling the photodoping region in the MoTe2/BN heterostructure. The MoTe2 diode demonstrates an ideality factor of ≈1.13 with a current on/off ratio of ≈1.7 × 104, and the gain of the inverter reaches ≈98, illustrating its great potential in the application of 2D logic electronics. Abstract 2D transition‐metal dichalcogenide (TMD)‐based electronic devices have been extensively explored toward the post‐Moore era. Huge efforts have been devoted to modulating the doping profile of TMDs to achieve 2D p–n junctions and inverters, the fundamental units in logic circuits. Here, photoinduced nonvolatile and programmable electron doping in MoTe2 based on a heterostructure of MoTe2 and hexagonal boron nitride (BN) is reported. The electron transport property in the MoTe2 device can be precisely controlled by modulating the magnitude of the photodoping gate exerted on BN. Through tuning the polarity of the photodoping gate exerted on BN under illumination, such a doping effect in MoTe2 can be programmed with excellent repeatability and is retained for over 14 d in the absence of an external perturbation. By spatially controlling the photodoping region in MoTe2, a photoresist‐free p–n junction and inverter in the MoTe2 homostructure are achieved. The MoTe2 diode exhibits a near‐unity ideality factor of ≈1.13 with a rectification ratio of ≈1.7 × 104. Moreover, the gain of the MoTe2 inverter reaches ≈98, which is among the highest values for 2D‐material‐based homoinverters. These findings promise photodoping as an effective method to achieve 2D‐TMDs‐based nonvolatile and programmable complementary electronic devices.
Published in: "Advanced Materials".