In article number 1803273, Lianqing Liu and co‐workers propose a unique mask‐free and marker‐free lithography technique to fabricate a sub‐micrometer‐sized 2D material thin‐film transistor using the phase mode of atomic force microscopy. This method does not change the chemical, physical, and electrical properties of 2D materials. It offers a flexible, easy, effective, and low‐cost way to fabricate prototypes of sub‐micrometer‐sized devices, and provides the opportunity to explore the potential performance of 2D materials.
Published in: "Small".